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PECVD (Plasma Enhanced Chemical Vapor Deposition)

Title: PECVD (Plasma Enhanced Chemical Vapor Deposition) Author: joshua Last modified by: joshua Created Date: 10/24/2003 4:51:56 AM Document presentation format

http://www.eng.auburn.edu/~tzengy/ELEC7730/ELEC%207730%20Fall%202003/Fall%202003%20Presentation%201/Park%20-%20PECVD.ppt

Date added: November 15, 2011 - Views: 113

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Plasma CVD Carbon Nanotubes

Plasma CVD Carbon Nanotubes Instructor: Yonhua Tzeng An-Jen Cheng February 25 2004

http://www.eng.auburn.edu/~tzengy/ELEC6750%20Spring%202004/Student%20Presentation%201/An-jen%20Chang%20-%20plasma%20CVD%20%20carbon%20nanotubes.ppt

Date added: December 8, 2011 - Views: 20

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Deposition methods - ttu.ee

Plasma Enhanced CVD (PECVD) PECVDplasma-enhanced CVD: – glow-discharge plasmas (usually RF field: 100 kHz – 40 MHz), or. MW – 2.54 . GHz

http://www.ttu.ee/public/m/Mehaanikateaduskond/Instituudid/Materjalitehnika_instituut/mtx9010/Korgtehnoloogia_Deposition_methods.pptx

Date added: December 15, 2013 - Views: 4

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Plasma Processing Overview - NSF/SRC ERC Homepage

... Plasma Parameters Uses of Plasma Processing in Semiconductor Industry Chemical Vapor Deposition (CVD) ... Dry Cleaning in place of wet chemical rinses to remove residues and contamination Plasma-Enhanced CVD (PECVD) ...

http://www.erc.arizona.edu/Education/MME%20Course%20Materials/MME%20Modules/Plasma%20Processing%20Module/Plasma1%20-%20Overview.ppt

Date added: August 23, 2011 - Views: 49

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Slide 1

Be careful what you wish for SiO2 backside protection A coating of SiO2 is deposited on the backside of the wafer to insolate it from the doping process PECVD Plasma Enhanced Chemical Vapor Deposition PECVD is used extensively in the manufacture of microelectronic devices because it allows for ...

http://coefs.uncc.edu/jahudak/files/2011/07/Solar-Cell-Fundamentals-Lab-Lecture-5A-PECVD-SiO2-revised-9-7-121.ppt

Date added: April 11, 2013 - Views: 2

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Reaction Engineering: Chemical Vapor Deposition

Reaction Engineering: Chemical Vapor Deposition CVD Quak Foo Lee Department of Chemical and Biological Engineering The University of British Columbia

http://www.chmltech.com/reactors/cvd.pps

Date added: November 1, 2011 - Views: 27

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Absorption on the surface - physisorption and Chemisorption

- physisorption and Chemisorption Typical several eVs Physisorption Van der Waals bonding (dipole) Weak (<0.4 eV) always atomic/molecular ... MOCVD—metalorganic CVD; – PCVD—photo CVD; – PECVDplasma-enhanced CVD; – ALE—atomic layer epitaxy.

http://www.physics.nus.edu.sg/~phygaoxy/12Adsorption.ppt

Date added: December 25, 2012 - Views: 54

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Thin Film Materials - Northern Illinois University

Plasma enhanced CVD (PECVD). Plasma / ionization catalyzes reactions. Lower temperatures can be used. Hot-wall thermal CVD (HWCVD). Large barrel holds wafers / substrates. High temperatures (1000 °C). Metalorganic CVD (MOCVD).

http://www.ceet.niu.edu/cecourse/UEET%20235/Thin%20Film%20Materials.ppt

Date added: January 27, 2012 - Views: 76

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Thin film deposition.ppt - California State University ...

Thin Film Deposition Topics: Chemical Vapor Deposition Physical Vapor Deposition Evaporation Sputtering Strengths and Weaknesses Basic Calculations ... Recall that: Decreasing Ptotal increases DG, hG and v Plasma Enhanced CVD (PECVD) ...

http://www.csun.edu/~rdconner/630/slides/Thin%20film%20deposition.ppt

Date added: March 12, 2013 - Views: 16

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Presentation Title - Chabot College

ECD = electrochemical deposition; CVD = chemical vapor deposition; PECVD = plasma-enhanced CVD; HDP-CVD = high-density plasma CVD; SW = single-wafer . Spares. Productivity Services. Performance Upgrades. Reliant Systems. 7/31/13:

http://www.chabotcollege.edu/faculty/bmayer/ChabotEngineeringCourses/ENGR-10_Into_to_Engrng/E10_Guest_Speakers/AlanSchoepp_Chabot%20College%20Intro_ENGR10_Sp14.pptx

Date added: February 25, 2014 - Views: 13

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PowerPoint Presentation

... (CVD) PECVD (Plasma Enhanced) LPCVD (Low Pressure) Electroplating Thermal Evaporation http://www.icmm.csic.es/fis/english/ evaporacion_resistencia.html Based on the sublimation Fast Low surface damage Difficult to control Limited materials ...

http://www.me.utexas.edu/~lishi/L18

Date added: May 23, 2014 - Views: 1

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No Slide Title

... for oxide etch e- + CF4 CF3 + F + e- 4F + SiO2 SiF4 + 2O Enhanced etch chemistry Plasma Enhanced CVD PECVD with SiH4 and NO2 ... Independent film stress control Chamber dry clean Comparison of PECVD and LPCVD Gap Fill by HDP-CVD PECVD and Plasma Etch Chambers CVD: ...

http://www.me.ntut.edu.tw/introduction/lab/%E8%87%AA%E5%8B%95%E5%8C%96%E5%AF%A6%E9%A9%97%E5%AE%A4/paper/ch07.ppt

Date added: October 1, 2012 - Views: 8

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Procedure ITRS CVD/ALD precursor tables

Procedure ITRS CVD/ALD precursor tables Andreas Neuber, Dave Roberts General approach - Precursors Procedure ITRS CVD/ALD precursor tables Andreas Neuber, Dave Roberts General approach - Precursors Literature Input by FEP, Interconnect Input by FEP, Interconnect Master table Candidate table YE 9 ...

http://www.itrs.net/Links/2009ITRS/LinkedFiles/Yield/Procedure%20ITRS%20CVD_100207.ppt

Date added: June 9, 2013 - Views: 27

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Slide 1

Self-aligned gate Metal-Semiconductor FET

https://filebox.ece.vt.edu/~LiaB/ECE4234/Lectures/ThinFilmDeposition.ppt

Date added: October 25, 2013 - Views: 4

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Carbon Nanotube Electronics - UROP

Carbon Nanotube Electronics Presented By: Yu-Jin Chen Mentor: Professor Philip Collins IM-SURE 2007 My Work: COMSOL model of a CNT device Tested two methods of depositing SiO2: Electron beam evaporation (E-Beam) Plasma-enhanced chemical vapor deposition (PECVD; BMR) Also tested etching metal ...

http://www.urop.uci.edu/im-sure/2007_summer/03/03_presentation.ppt

Date added: October 13, 2011 - Views: 63

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Thin Film Growth Applications

... Pulsed Laser Deposition MBE (molecular beam epitaxy) CVD (Chemical Vapor Deposition) APCVD (atmospheric CVD) LPCVD (low-pressure CVD) PECVD (Plasma-enhanced CVD) LECVD (Laser-enhanced CVD) MOCVD (Metal-organic CVD) ...

http://easa.tamu.edu/e3/docs/2010-cd-files/Collins%20Jarrod/Collins%20-%20files%20for%20website/Collins%20-%20Research%20Question%20presentation.ppt

Date added: September 9, 2014 - Views: 1

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The Deposition Process - UB Engineering - University at Buffalo

... Dry processes use chemical vapors Atmospheric Pressure Chemical Vapor Deposition Low Pressure Chemical Vapor Deposition Plasma Enhanced Chemical Vapor Deposition Chemical Deposition Processes Atmospheric Chemical Vapor Deposition ... What is a principal advantage of plasma enhanced CVD?

http://www.eng.buffalo.edu/Research/NAMCATE/students/ppt/tdmdepo.ppt

Date added: November 18, 2013 - Views: 19

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PowerPoint Presentation

... surface deterioration of the step coverage and filling. transport less important low pressure DG 1/Ptotal Plasma Enhanced Chemical Vapor Deposition(PECVD) Used when : Low T ... increase deposition rates High Density Plasma CVD dense layers ( SiO2) at low ...

http://www0.egr.uh.edu/Courses/ECE/ECE6466/IC_Eng/Chapter9_Deposition.ppt

Date added: November 26, 2013 - Views: 14

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Download Allwin21 Sputtering Deposition System Presentation ...

Chemical Vapor Deposition (CVD)-Film is formed by chemical reaction on the surface of substrate. Low-Pressure CVD (LPCVD) Plasma-Enhanced CVD (PECVD) Atmosphere-Pressure CVD (APCVD) Metal-Organic CVD (MOCVD) Oxidation. Spin Coating. Platting.

http://www.allwin21.com/upload/File/Allwin21%20Presentation%20Sputtering%20Deposition%20Systems.ppsx

Date added: May 3, 2013 - Views: 13

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No Slide Title

Chemical Vapor Deposition ... Operational Overview Polycrystaline Silicon Silicon Dioxide Nitride Films LPCVD APCVD PECVD Chemical Vapor Deposition Current Options Atmospheric Pressure CVD Plasma Enhanced CVD Low Pressure CVD CVD Silicon Nitride Silicon dioxide Polycrystalline Silicon ...

http://natasha.eng.usf.edu/gilbert/courses/micro-nano_fabrication_basics/showtime/powerpoints/cvd_introduction.ppt

Date added: September 12, 2013 - Views: 5

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CVD SRF CAVITIES - Istituto Nazionale di Fisica Nucleare

CVD SUPERCONDUCTING RF CAVITIES: PAST, PRESENT and ... A15 Compounds:A3B At 400oC, use PECVD*. Success with magnesium diboride means: Returning to ... but it is not necessary to go that high. * plasma-enhanced chemical vapor deposition We would like to find a PECVD process which works at low ...

http://www.lnl.infn.it/~master/slideshow/tuesday/Hand_PADUA_TALK_final.ppt

Date added: October 24, 2013 - Views: 7

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PowerPoint Presentation

Chemical Vapor Deposition (CVD) Different thin film textures Step Coverage of Deposited Films SiO2 Films for masking & protection Other Films for masking & protection Silicide Contacts Chemical Vapor Deposition ... n Low-pressure CVD (LPCVD) Plasma-enhanced CVD (PECVD) ...

http://www.physics.nus.edu.sg/~phywxs/teaching/PC3242/Lect_Film_Dep.ppt

Date added: September 19, 2012 - Views: 12

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CVD (화학시상증착) 공정 - 멋진 e세상!! ::

PECVD (Plasma Enhanced CVD) 강한 전압으로 야기된 plasma를 이용하여 반응물질을 활성화시켜서 기상으로 증착시키는 방법 또는 장치. TFT-LCD에서는 insulator층과 a-Si 증착에 사용한다. 반응 ...

http://bewon.tistory.com/attachment/49685da95e636CQ.ppt

Date added: April 16, 2012 - Views: 13

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Researching thin films - Student Services | College of ...

PECVD (Plasma-enhanced CVD) LECVD (Laser-enhanced CVD) MOCVD (Metal-organic CVD) Solution based deposition techniques. Sol-gel. PAD (Polymer assisted deposition) Dr. Haiyan Wang – Functional Thin Film Processing and Characterization Group. Characterization.

http://essap.tamu.edu/e3/docs/2010-cd-files/Hudson%20Steve/Hudson%20-%20files%20for%20website/Hudson%20-%20What%20is%20the%20Research%20Question.pptx

Date added: October 25, 2013 - Views: 3

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Spintronics Integrating magnetic materials with semiconductors

MEMS devices: How do we make them? A mechanism Gear chain Hinge Gear within a gear Sandia MEMS

http://maecourses.ucsd.edu/~pbandaru/mae268-sp09/Class%20Readings_files/MAE%20268_Lec3_Spring_2009.ppt

Date added: October 17, 2013 - Views: 2

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Ch3 - Electrical Engineering & Computer Sciences | EECS at UC ...

... LPCVD (Low Pressure CVD) : Good uniformity. Used for poly-Si, oxide, nitride. PECVD (Plasma Enhanced CVD) : Low temperature process and high deposition rate. Used for oxide, nitride, etc. 3.7.2 Chemical Vapor Deposition (CVD) Modern Semiconductor Devices for Integrated Circuits (C ...

http://www.eecs.berkeley.edu/~hu/Chenming-Hu-ch3-slides.ppt

Date added: November 8, 2011 - Views: 72

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A Review on Carbon Nanotube Probes for Microscopy Applications

Growing Method Qi Ye et al., Nano Lett. 2004 PECVDPlasma Enhanced CVD Growing Method Qi Ye et al., Nano Lett. 2004 PECVDPlasma Enhanced CVD Qi Ye et al., Nano Lett. 2004 Growing Method Growing Method No prefabricated silicon probe wafers needed; Better control of the CNT location, ...

http://clifton.mech.northwestern.edu/~me382/finalproject/ME382_Winter05_CNT_Probes.ppt

Date added: August 12, 2011 - Views: 23

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Slide 1

... the typical process to deposit anti-reflective coating is PECVD PECVD Plasma Enhanced Chemical Vapor Deposition PECVD is used extensively in the manufacture of microelectronic devices because it allows for lower temperature processes Just like in sputtering, a plasma is formed in an ...

http://coefs.uncc.edu/jahudak/files/2011/09/Solar-Cell-Fundamentals-Lab-Lecture-8-Anti-reflective-coating.ppt

Date added: May 23, 2012 - Views: 7

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應用新型主發光體系統之高效率紅色摻雜型 ...

Introduction for PECVD Plasma Enhanced Chemical Vapor Deposition * thin film deposition steps (a) crystal growth (b) grain growth and (c) grain coalescence (get together) (d) The seam Road to fill the gap (e) The deposition film growth (1) physical adsorption on the wafer surface ...

http://content.ctld.nfu.edu.tw/server/BT/content1/files/1002/C100203/%E4%B8%8A%E8%AA%B2%E5%BD%B1%E7%89%87/%E8%AC%9B%E7%BE%A9%E4%B8%8B%E8%BC%89/PECVD%E7%B3%BB%E7%B5%B1%E8%AC%9B%E7%BE%A9.ppt

Date added: December 7, 2013 - Views: 9

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Module 1: Basic Principles - University of Arizona

Semiconductor Manufacturing Processes Conrad T. Sorenson ... A variant of CVD called Plasma-Enhanced Chemical Vapor Deposition, ... The Plasma Enhanced (PE) CVD TEOS and Ozone TEOS processes can be alternated with intermediate etch backs ...

http://www.erc.arizona.edu/Education/MME%20Course%20Materials/MME%20Modules/Manufacturing%20Module/Manufac%20Overview.ppt

Date added: September 19, 2011 - Views: 170

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Prezentacja programu PowerPoint - Strona główna AGH

The two most important CVD technologies are the Low Pressure CVD (LPCVD) and Plasma Enhanced CVD (PECVD). The PECVD process can operate at lower temperatures (down to 300° C) thanks to the extra energy supplied to the gas molecules by the plasma in the reactor.

http://home.agh.edu.pl/~pisar/downloads/2-MEMS-technol.ppt

Date added: May 9, 2013 - Views: 11

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PowerPoint Presentation

CH4) Carbon deposition Chemical Reaction on surface Carbon PECVD apparatus available in Purdue/Birck (Fisher) Microwave plasma enhanced (PE) chemical vapor deposition (CVD) ...

http://www.physics.purdue.edu/quantum/files/grapheneCTRC_oct2008a.ppt

Date added: November 9, 2011 - Views: 124

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§7.3 化学气相沉积(CVD) - 四川大学课程中心3.0

Chapter 7.3 Chemical Vapor Deposition 2. The deposition set-up The system contains a reaction Chamber, Gas supplier ... (APCVD) Low Pressure CVD (LPCVD); ~a few hundred Pa Photo CVD (PCVD); Plasma Enhanced CVD (PECVD); Metal-Organic CVD (MOCVD) and; Others. Main Tasks: Different ...

http://ccftp.scu.edu.cn:8090/Download/31b14485-efd2-43a9-ad2a-deab4f94ee24.ppt

Date added: August 12, 2014 - Views: 1

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PowerPoint Presentation

... (LPCVD) system in a three-zone furnace (c) parallel-plate plasma-enhanced system (d) photo-enhanced (PECVD) system using a three-zone furnace. ... Low Pressure Chemical Vapor Deposition (LPCVD) ...

http://eelinux.ee.usm.maine.edu/courses/ele464/Lecture%20Notes/464-Fab_Slides_Ch06.ppt

Date added: December 19, 2013 - Views: 3

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CLD, Inc.

TFT 공학 특론 강의 4 박막 증착 종류 CVD (Chemical Vapor Deposition) : Thermal CVD, Plasma Enhanced CVD (PECVD), etc. PVD (Physical Vapor Deposition) : Thermal Evaporation, Electron-Beam evaporation, Sputtering Deposition, Reactive Sputtering Deposition, etc. Thin Film ...

http://post-bk21.hoseo.ac.kr/board/file/down.htm?file=./bbs_data/&filename=TFT%B0%F8%C7%D0%B0%AD%C0%C74.ppt

Date added: September 18, 2012 - Views: 9

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SLUNCE A ŽIVOT - ΤΕΙ Πάτρας

Plasma enhanced CVD (PECVD) RF electrode and substrate create the capacitor structure. In this space the plasma and incorporated deposition of material on substrate takes place The deposition rate is higher than in the case of LPCVD, ...

http://www.teipat.gr/socrates-ip2006/files/Solar_cell_fabrication_technology.ppt

Date added: May 31, 2012 - Views: 16

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PowerPoint Presentation

PECVD PECVD =Plasma Enhanced Chemical Vapor Deposition procede a temperature non elevate (sotto i 300°C) (LPCVD ~ 600°C) ... (HTCVD) Low Pressure CVD (LPCVD) Plasma Assisted CVD (PACVD) Plasma enhanced CVD (PECVD) Metallorganic CVD ...

http://studenti.di3.units.it/Reattori%20Chimici%20II/Slides/26_Reattori_CVD%20.ppt

Date added: June 7, 2013 - Views: 7

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Slide 1

Chemical Vapour Deposition (CVD) David Xiulei Ji Definition of typical CVD: ... AP PECVD: Atmospheric pressured plasma enhanced CVD c) MO CVD: Metal organo CVD. Organic ligands as reducing agent. d) Catalytic CVD (Ni, Co, Fe nano particles) ...

http://www.chembio.uoguelph.ca/educmat/chm753/Third%20Class/David.ppt

Date added: May 31, 2012 - Views: 11

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Diamond-like Carbon Thin Film with Controlled Zeta Potential ...

... PECVD A capacitively coupled r.f. discharge plasma used to deposit films on a substrate. 30 ... biological implants, MEMS devices. Common Methods: PVD and CVD ! Introduction Plasma-enhanced chemical vapor deposition (PECVD) developed by Erdemir et al. Ultra-low friction hydrogenated ...

http://drajput.com/slideshare/downloads/insitu_tem.ppt

Date added: May 31, 2012 - Views: 7

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Slide 1

... in comparison with chemical vapour deposition (CVD) processes; electric [and magnetic] field is applied; the variety of PVD technologies can be ... the three main CVD technologies are thermal CVD, plasma-enhanced CVD (PECVD), and laser CVD (LCVD). Fig. 4. Example scheme of a CVD process ...

http://www.ttu.ee/public/m/Mehaanikateaduskond/Instituudid/Materjalitehnika_instituut/MTX0100/MTX0100_Pulbermetallurgia_ja_pindamine_sadestus.ppt

Date added: September 28, 2013 - Views: 6

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PowerPoint Presentation

Thin Film Deposition Quality – composition, defect density, mechanical and electrical properties Uniformity – affect performance (mechanical , electrical)

http://www0.egr.uh.edu/courses/ECE/ECE6384-21460/Chapter2_Part3.ppt

Date added: September 4, 2014 - Views: 1

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Slide 1

PECVD (Plasma Enhanced CVD) Plasma helps to break up gas molecules: high reactivity, able to process at lower temperature and lower pressure (good for electronics on plastics). Pressure higher than in sputter deposition: more collision in gas phase, less ion bombardment on substrate.

http://ece.uwaterloo.ca/~bcui/content/NE%20343/Chapter%209%20Thin%20film%20deposition%20_%20I.pptx

Date added: February 17, 2012 - Views: 50

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fn1_3b_nanoparticles.ppt

Plasma arcing Used primarily for CNTs Co-Cu nanoparticles Chemical Vapor Deposition CVD Reactantsg → Productss SiH4(g) + N2O(g) → SiO2(s) + NH3(g) Low pressure LPCVD Plasma enhanced: PECVD, PE-LPCVD Temperature, pressure, flow, power ...

http://api.ning.com/files/imQsEYXCr-W4rcRnrDlgW*CgX9--0inZkoFmRQNx2UzUAgdjhTAtjJKwsnPX8w1QpiynIGMtep2aWlTYNBiu1-HV2PCxuIrD/fn1_3b_nanoparticles.ppt

Date added: October 9, 2011 - Views: 57

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Microelectronics Technology - hi

... Disadvantages: Highly toxic, very expensive source material, environmental disposal costs are high. Plasma Enhanced (PECVD ... look at film deposition Film deposition & growth Physical deposition Thermal evaporation E-beam evaporation Sputtering Chemical vapor deposition CVD LPCVD PECVD ...

http://zeeman.raunvis.hi.is/~sthi/files/teaching/verkl_edl_v2008/MicroelectronicsTechnology.ppt

Date added: August 3, 2013 - Views: 23

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THIN FILM TECHNOLOGY

Thin Film Deposition – CVD and PVD. Variety of Chemical Vapor Depositions are used to layer on subsequent Structural and Sacrificial Layers. Metals are deposited using PVD (Physical Vapor Deposition – evaporation is an example)

http://www.aryansexport.com/PPT/PPT%20on%20thin%20film%20technology.pptx

Date added: September 4, 2014 - Views: 1

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投影片 1 - 歡迎來到MyOOPS開放式課程介面

... which prevents O2 diffusion 2.008-spring-2003 Chemical Vapor Deposition Thermal energy to dissociate gases and deposit thin films on surfaces, high productivity, better step coverage low pressure (LPCVD), atmospheric pressure (APCVD), plasma enhanced (PECVD ...

http://www.myoops.org/cocw/mit/NR/rdonlyres/Mechanical-Engineering/2-008Spring2004/4A5F404A-521E-4370-9F0B-D495288058F6/0/12tinyprod_6_f_1.ppt

Date added: December 2, 2011 - Views: 27

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ㅇㄹㅇ - 한국과학기술연구원

In the case of Plasma Enhanced CVD, ... We explain this phenomenon in the case of thermal CVD, bur this could be applied to PECVD, because PECVD would have a higher energy enough to decompose the molecular N2. From experimental data analyzed by TEM and SEM, ...

http://diamond.kist.re.kr/DLC/R&D_DB/ICMCTF2003_tykim.ppt

Date added: January 21, 2014 - Views: 3

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Module 1: Basic Principles

Sorenson. Semiconductor Manufacturing Technology: Semiconductor Manufacturing Processes. Conrad T. Sorenson. Praxair, Inc. 1999 Arizona Board of Regents for The University of Arizona

http://www2.sunysuffolk.edu/rosesr/ACC212/Lecture/ManufactOverview.pptx

Date added: August 25, 2013 - Views: 6

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Surface Micromachining

Oxide by plasma enhanced chemical vapor deposition (PECVD) PECVD is done at lower temperature, with lower quality. It is generally undoped. ... Both are isotropic etchants Organic Sacrificial Layer Photoresist etching by plasma etching ...

http://home.sogang.ac.kr/sites/memslab/%EC%9E%90%EB%A3%8C%EC%8B%A4/Lists/b16/Attachments/1/08-surfaceetch.ppt

Date added: November 23, 2013 - Views: 2

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Folie 1

... (Plasma enhanced chemical vapor deposition): mittels eines Plasmas werden die chemischen Reaktionen initiiert Vorteil: geringere Temperaturen als bei einer normalen CVD (ca. 400 - 500 °C) Epitaktisches Wachstum CVD - Anwendung ...

http://home.arcor.de/kgrenader/uni/d%FCnne%20Schichten.ppt

Date added: September 13, 2013 - Views: 4